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CHARACTERIZATION OF SPUTTER DEPOSITED INCONEL CARBON X-RAY MULTILAYERS

TitleCHARACTERIZATION OF SPUTTER DEPOSITED INCONEL CARBON X-RAY MULTILAYERS
Publication TypeJournal Article
Year of Publication1993
AuthorsAouadi, MS, Parsons, RR, Wong, PC, Mitchell, KAR
JournalJournal of Vacuum Science & Technology a-Vacuum Surfaces and Films
Volume11
Pagination115-124
Date PublishedJan-Feb
Type of ArticleArticle
ISBN Number0734-2101
KeywordsCARBIDE, FILMS, OPTICS, SI, STABILITY
Abstract

The reflectivity of x-ray multilayers made of new pairs of materials was theoretically calculated at a wavelength of 45 angstrom. Carbon and inconel were then selected for ’’low index’’ and ’’high index’’ layers, respectively, in the multilayer system. Single layers, bilayers, and multilayers of carbon and inconel were characterized by grazing x-ray reflectometry (GXR), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and spectroscopic ellipsometry (SE). From GXR data at 1.54 angstrom refractive indices and film thicknesses of inconel and carbon layers were obtained. From an analysis of SE data, the dielectric function and the thickness as of inconel and carbon thin films were deduced. XPS and AES measurements revealed the presence of carbides at the interface between carbon and inconel. GXR analysis was performed on ten-layer C/inconel multilayers. The GXR interference pattern was found to broaden after annealing the samples at 600-degrees-C.

URL<Go to ISI>://A1993KH55700015