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Chemical properties of a Nb/Zr interface studied by XPS

TitleChemical properties of a Nb/Zr interface studied by XPS
Publication TypeJournal Article
Year of Publication1997
AuthorsWong, KC, Wong, PC, Li, YS, Mitchell, KAR
JournalSurface Review and Letters
Volume4
Pagination33-37
Date PublishedFeb
Type of ArticleArticle
ISBN Number0218-625X
Keywordscorrosion, electron, HYDROGEN, NUCLEAR-REACTION ANALYSIS, SURFACES, THIN-FILMS, WT-PERCENT NB, ZIRCALOY-2, ZIRCONIUM-OXIDE, ZR
Abstract

A film of niobium (similar to 15 A thick) deposited under ultrahigh vacuum (UHV) conditions on polycrystalline zirconium was studied by x-ray photoelectron spectroscopy (XPS) as it was taken through a series of sequential treatments. The Nb-Zr interface, associated with a Nb 3d(5/2) peak at 203.4 eV, is indicated to passivate the underlying Zr to oxygen and hydrogen plasma treatments, which in the absence of Nb would yield substantial oxidation. On heating to 500 degrees C, the pure metallic Nb 3d(5/2) component at 202.2 eV appears, and this change is accompanied by removal of the passivation effect on the substrate.

URL<Go to ISI>://A1997XA62100005