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XPS study of carbon/inconel bilayers as a function of substrate bias

TitleXPS study of carbon/inconel bilayers as a function of substrate bias
Publication TypeJournal Article
Year of Publication1996
AuthorsAouadi, MS, Wong, PC, Mitchell, KAR
JournalApplied Surface Science
Volume99
Pagination319-324
Date PublishedAug
Type of ArticleArticle
ISBN Number0169-4332
KeywordsGROWTH, ION-BOMBARDMENT, MULTILAYERS, REFLECTIVITY
Abstract

X-ray photoelectron spectroscopy (XPS) was used to study the chemical content of sputter deposited carbon/inconel bilayers as a function of substrate bias voltage. The thickness of the layers was 10 Angstrom for inconel and 12.5 Angstrom for carbon; they have been used as the low and high index materials in X-ray multilayers that operate at 45 Angstrom wavelength, at normal incidence. The objective was to investigate the most favourable growth conditions. The carbon layer formed a continuous film only for samples grown with a bias voltage of -40 V. Single layers of carbon and inconel were also studied as a function of substrate bias using grazing X-ray reflection (GXR) to investigate the effect of ion bombardment on the surface quality of the layers. The smoothest inconel single layers were obtained with a moderate substrate bias (-40 to -60 V) while the roughness of single carbon layers was not affected by the substrate bias. We conclude that the open structure observed in bilayers grown with substrate bias voltages other than -40 V is due to the rougher underlying inconel layer, which in turn ’roughens’ the thin carbon layer.

URL<Go to ISI>://A1996VD97500007