@article {5011,
	title = {A capacitively coupled microplasma (CC mu P) formed in a channel in a quartz wafer},
	journal = {Journal of Analytical Atomic Spectrometry},
	volume = {16},
	number = {9},
	year = {2001},
	note = {ISI Document Delivery No.: 477MPTimes Cited: 42Cited Reference Count: 172001 European Winter Conference in Plasma SpectrochemistryFEB 04-08, 2001LILLEHAMMER, NORWAY},
	month = {Sep},
	pages = {919-921},
	type = {Proceedings Paper},
	abstract = {An optical emission plasma source with dimensions as small as 0.25 x 0.25 x 5 mm has been implemented on a quartz wafer. The He plasma, formed using a parallel plate, capacitively coupled geometry, operates at atmospheric pressure, uses a 13.56 MHz power source at 5-25 W, with gas flows between 17-150 mL min (1), and is self-igniting. Parallel-plate capacitive power coupling is nearly ideal for generating and sustaining a plasma discharge "on a chip" since it can be implemented using a very simple electrode structure and does not require tuned or resonant structures.},
	keywords = {ANALYSIS SYSTEMS, ATMOSPHERIC-PRESSURE, EMISSION DETECTOR, GAS-CHROMATOGRAPHY, MICROSTRIP TECHNOLOGY, PLASMA SOURCE, SPECTROMETRY},
	isbn = {0267-9477},
	url = {<Go to ISI>://000171287600003},
	author = {Bass, A. and Chevalier, C. and Blades, M. W.}
}
