@article {3595,
	title = {XPS study of carbon/inconel bilayers as a function of substrate bias},
	journal = {Applied Surface Science},
	volume = {99},
	number = {4},
	year = {1996},
	note = {ISI Document Delivery No.: VD975Times Cited: 0Cited Reference Count: 14},
	month = {Aug},
	pages = {319-324},
	type = {Article},
	abstract = {X-ray photoelectron spectroscopy (XPS) was used to study the chemical content of sputter deposited carbon/inconel bilayers as a function of substrate bias voltage. The thickness of the layers was 10 Angstrom for inconel and 12.5 Angstrom for carbon; they have been used as the low and high index materials in X-ray multilayers that operate at 45 Angstrom wavelength, at normal incidence. The objective was to investigate the most favourable growth conditions. The carbon layer formed a continuous film only for samples grown with a bias voltage of -40 V. Single layers of carbon and inconel were also studied as a function of substrate bias using grazing X-ray reflection (GXR) to investigate the effect of ion bombardment on the surface quality of the layers. The smoothest inconel single layers were obtained with a moderate substrate bias (-40 to -60 V) while the roughness of single carbon layers was not affected by the substrate bias. We conclude that the open structure observed in bilayers grown with substrate bias voltages other than -40 V is due to the rougher underlying inconel layer, which in turn {\textquoteright}roughens{\textquoteright} the thin carbon layer.},
	keywords = {GROWTH, ION-BOMBARDMENT, MULTILAYERS, REFLECTIVITY},
	isbn = {0169-4332},
	url = {<Go to ISI>://A1996VD97500007},
	author = {Aouadi, M. S. and Wong, P. C. and Mitchell, K. A. R.}
}
