@article {3283,
	title = {CHARACTERIZATION OF A RADIOFREQUENCY DISCHARGE USED FOR DOWNSTREAM PLASMA OXIDATION OF SI},
	journal = {Journal of Applied Physics},
	volume = {77},
	number = {4},
	year = {1995},
	note = {ISI Document Delivery No.: QG500Times Cited: 4Cited Reference Count: 26},
	month = {Feb},
	pages = {1690-1695},
	type = {Article},
	keywords = {CHEMICAL-VAPOR-DEPOSITION, GROWTH, KINETICS, SILICON DIOXIDE},
	isbn = {0021-8979},
	url = {<Go to ISI>://A1995QG50000053},
	author = {Cook, J. G. and Lebrun, L. and Li, Z. M. and Ogryzlo, E. A.}
}
