Title | Tensor LEED analyses for the (root 3x root 3)R30 degrees and c(4x2) structures formed by sulphur chemisorbed on the (111) surface of rhodium |
Publication Type | Journal Article |
Year of Publication | 1996 |
Authors | Wong, KC, Liu, W, Saidy, M, Mitchell, KAR |
Journal | Surface Science |
Volume | 345 |
Pagination | 101-109 |
Date Published | Jan |
Type of Article | Article |
ISBN Number | 0039-6028 |
Keywords | ABSORPTION FINE-STRUCTURE, ASSIGNMENT, chalcogens, CRYSTAL SURFACES, HOLLOW ADSORPTION SITE, LOW ENERGY ELECTRON DIFFRACTION (LEED), LOW INDEX SINGLE, NI(111), NO, rhodium, SURFACE RELAXATION |
Abstract | Tensor LEED analyses have been made for the Rh(111)-(root 3 x root 3)R30 degrees-S and Rh(lll)-c(4 x 2)-S surface structures formed by S chemisorbed at 1/3 and 1/2 monolayer coverages respectively. For the lower-coverage form, S adsorbs on the regular three-coordinate sites which continue the fee packing sequence; the S-Rh bond lengths are indicated to equal 2.23 Angstrom, and relaxations in the metallic structure are negligible. In the c(4 x 2) form, the adsorption occurs equally on both types of three-coordinate site (fee and hcp), although some surface Rh atoms bond to two S atoms while others bond to just one, and this sets up some interesting relaxations. Specifically, the S atoms displace laterally from the centre of the three-fold sites by 0.20 to 0.29 Angstrom, and the first metal layer is buckled by about 0.23 Angstrom. The first-to-second interlayer spacing in the metal expands to 2.26 Angstrom from the bulk value of 2.20 Angstrom. The average S-Rh bond lengths equal 2.22 Angstrom, and so they are not significantly changed from that in the low-coverage form. The structural evolution for S chemisorbed on the (111) surface of rhodium with increasing coverage is compared with the corresponding evolution on the Rh(110) surface. |
URL | <Go to ISI>://A1996TT59200014 |