| Title | XPS investigations of the reactivities of oxidized Zr/Nb interfaces formed by deposition on a gold substrate |
| Publication Type | Journal Article |
| Year of Publication | 1996 |
| Authors | Li, YS, Wong, KC, Wong, PC, Mitchell, KAR |
| Journal | Applied Surface Science |
| Volume | 103 |
| Pagination | 389-393 |
| Date Published | Dec |
| Type of Article | Article |
| ISBN Number | 0169-4332 |
| Keywords | corrosion, HYDROGEN, NUCLEAR-REACTION ANALYSIS, THIN-FILMS, WT-PERCENT NB, ZIRCALOY-2, ZIRCONIUM-OXIDE, ZR |
| Abstract | The interaction of a film of Zr (similar to 38 Angstrom thick) deposited under ultrahigh vacuum (UHV) on to an approximately 12 Angstrom film of NbO on a gold substrate has been studied with X-ray photoelectron spectroscopy (XPS). Evidence is presented for an interfacial conversion from Zr and NbO to ZrO2 and Nb. The reactivity of this sample was studied through a series of sequential treatments. Although changes occur in the topmost layer, the Zr/Nb interfacial region, as identified by a shoulder at similar to 180 eV in Zr 3d and the 203.0 eV peak in Nb 3d, appears to be remarkably inert on heating at 300 degrees C under UHV, as well as on subjecting to O-2 and hydrogen plasma treatments. |
| URL | <Go to ISI>://A1996VX97900009 |
