| Title | CHARACTERIZATION OF A RADIOFREQUENCY DISCHARGE USED FOR DOWNSTREAM PLASMA OXIDATION OF SI |
| Publication Type | Journal Article |
| Year of Publication | 1995 |
| Authors | Cook, JG, Lebrun, L, Li, ZM, Ogryzlo, EA |
| Journal | Journal of Applied Physics |
| Volume | 77 |
| Pagination | 1690-1695 |
| Date Published | Feb |
| Type of Article | Article |
| ISBN Number | 0021-8979 |
| Keywords | CHEMICAL-VAPOR-DEPOSITION, GROWTH, KINETICS, SILICON DIOXIDE |
| URL | <Go to ISI>://A1995QG50000053 |
