Title | CHARACTERIZATION OF A RADIOFREQUENCY DISCHARGE USED FOR DOWNSTREAM PLASMA OXIDATION OF SI |
Publication Type | Journal Article |
Year of Publication | 1995 |
Authors | Cook, JG, Lebrun, L, Li, ZM, Ogryzlo, EA |
Journal | Journal of Applied Physics |
Volume | 77 |
Pagination | 1690-1695 |
Date Published | Feb |
Type of Article | Article |
ISBN Number | 0021-8979 |
Keywords | CHEMICAL-VAPOR-DEPOSITION, GROWTH, KINETICS, SILICON DIOXIDE |
URL | <Go to ISI>://A1995QG50000053 |
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