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CHARACTERIZATION OF A RADIOFREQUENCY DISCHARGE USED FOR DOWNSTREAM PLASMA OXIDATION OF SI

TitleCHARACTERIZATION OF A RADIOFREQUENCY DISCHARGE USED FOR DOWNSTREAM PLASMA OXIDATION OF SI
Publication TypeJournal Article
Year of Publication1995
AuthorsCook, JG, Lebrun, L, Li, ZM, Ogryzlo, EA
JournalJournal of Applied Physics
Volume77
Pagination1690-1695
Date PublishedFeb
Type of ArticleArticle
ISBN Number0021-8979
KeywordsCHEMICAL-VAPOR-DEPOSITION, GROWTH, KINETICS, SILICON DIOXIDE
URL<Go to ISI>://A1995QG50000053